22 October 2009
Press release

Dutch Design Works named Best Exhibition of SICIW 2009

Wednesday evening 21 October, during the closing ceremony of the Shanghai International Creative Industry Week (SICIW), the Shanghai Creative Industry Centre awarded the Dutch participation with the Award for Best Exhibition of SICIW 2009, for the Architecture and Public Space presentation. The award was received by Maurice Pourchez of the Consulate General of the Kingdom of The Netherlands in Shanghai, on behalf of initiator Dutch Design Fashion Architecture (DutchDFA) and partner FAR Architecture & Design Centre Shanghai. The SICIW took place between 15 and 21 October.
 
The jury chose to award the prize to the Dutch presentation because of its serious and high quality content, showcasing work by distinguished Dutch architecture offices, and its clever exhibition design by Dutch designer Daan Bakker of DAF-Architects, including an innovative use of sustainable materials.

During the SICIW, high-ranking Shanghai government officials visited the exhibition several times, bringing different colleagues each time. At the end of each day, the green terrace of the Dutch pavilion became the liveliest spot of the SICIW exhibition grounds, with visitors from all participating countries including China.

The Architecture and Public Space conference on the Dutch Day on Saturday 17 October brought Chinese architects and architecture professors together with the members of the Dutch delegation for a lively debate, which ranged from social issues and ideal models of urban design to questions of sustainability and planning processes. Follow-up visits of delegation to Tongji and Hong Kong universities continued this exchange between Chinese and Dutch architects.

The Redlight fashion show on the Dutch Day attracted a huge crowd and yielded several interesting prospects for the participating designers, while the matchmaking programme was judged to be successful by the participants; some are going home with promising contacts and all have learnt a lot about doing architectural business in China.

Also on the Dutch Day, the Consul General of the Kingdom of the Netherlands mr Eric Verwaal, the Secretary General of the Shanghai Creative Industry Centre mr He, the director of FAR Architecture & Design Centre mr Giel Groothuis and ms Christine de Baan, programme director of DutchDFA signed a letter of intent to launch the Dutch Design WorkSpace in Shanghai.

Background

Architecture and Public Space
The Architecture and Public Space presentation highlighted how Dutch designers contribute to the design of public space, on various scales, from urban planning to street furniture. How to accommodate traffic and city residents, commercial and public interests as well as personal contact and large-scale gatherings are key concerns. In the context of China’s explosive urbanisation, the design of public space has become a highly topical issue.
The presentation showcased work by 15 prominent Dutch architecture and design agencies (AIM-Achitecture, Alliance-NL (Tekton Architects, Archipelontwerpers, OKRA Landscape Architects), Jo Coenen & Co Architects, KCAP Architects&Planners, KOW Architecture, KuiperCompagnons, MVRDV, NITA Design Group, NL Architects, SeARCH, UNStudio, VenhoevenCS Architects, Wiel Arets Architects, XML Architecture Research Urbanism, and industrial design agency npk design). The show was part of the DutchDFA Programme, which was launched earlier this year.

Incubator programme

DutchDFA has initiated this three-year incubator support programme, Dutch Design WorkSpace, in close collaboration with the Jing’an District, the Consul General of the Kingdom of the Netherlands, the Shanghai Creative Industry Centre, FAR Architecture & Design Centre and local partners. The programme will start immediately after the conclusion of the SICIW and will be officially opened in January 2010. The Dutch Design WorkSpace will be established in Shanghai.


END




For more information on the Dutch participation in SICIW 2009, please contact:
DutchDFA, Carlie Janszen, +31 10 4136252, cjanszen@dutchdfa.nl, or:
Clarisse Stulp, Communications Manager SICIW Shanghai, +86 13817343080, clarissestulp@gmail.com
See also www.dutchdfa.nl and www.dutchdesignworks.cn


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